SEMICONDUCTOR SCIENCE AND TECHNOLOGY

SEMICONDUCTOR SCIENCE AND TECHNOLOGY

SEMICOND SCI TECH
影响因子:2.1
是否综述期刊:
是否预警:不在预警名单内
是否OA:
出版国家/地区:ENGLAND
出版社:IOP Publishing Ltd.
发刊时间:0
发刊频率:Monthly
收录数据库:SCIE/Scopus收录
ISSN:0268-1242

期刊介绍

Devoted to semiconductor research, Semiconductor Science and Technology's multidisciplinary approach reflects the far-reaching nature of this topic.The scope of the journal covers fundamental and applied experimental and theoretical studies of the properties of non-organic, organic and oxide semiconductors, their interfaces and devices, including:fundamental propertiesmaterials and nanostructuresdevices and applicationsfabrication and processingnew analytical techniquessimulationemerging fields:materials and devices for quantum technologieshybrid structures and devices2D and topological materialsmetamaterialssemiconductors for energyflexible electronics.
《半导体科学与技术》致力于半导体研究,其多学科方法反映了这一主题的深远性质。该杂志的范围涵盖非有机、有机和氧化物半导体及其界面和器件的基础和应用实验和理论研究,包括:基本性质材料和纳米结构器件和应用制造和加工新的分析技术模拟新兴领域:量子技术的材料和器件混合结构和器件二维和拓扑材料超材料能量柔性电子学的半导体。
年发文量 206
国人发稿量 82.19
国人发文占比 0.4%
自引率 -
平均录取率0
平均审稿周期 一般,3-6周
版面费 US$2930
偏重研究方向 工程技术-材料科学:综合
期刊官网 http://iopscience.iop.org/journal/0268-1242
投稿链接 http://mc04.manuscriptcentral.com/sst-iop

期刊高被引文献

Molecular beam epitaxy growth of AlAs1−x Bi x
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AACF38
Low voltage & controlled switching of MoS2-GO resistive layers based ReRAM for non-volatile memory applications
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB2C09
Emergence of high quality sputtered III-nitride semiconductors and devices
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB3374
Characteristics of Al 2 O 3 /native oxide/n-GaN capacitors by post-metallization annealing
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AAFDBD
First demonstration of RF N-polar GaN MIS-HEMTs grown on bulk GaN using PAMBE
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB0761
Characterization of inhomogeneous Ni/GaN Schottky diode with a modified log-normal distribution of barrier heights
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB3071
Multi-layer elemental 2D materials: antimonene, germanene and stanene grown directly on molybdenum disulfides
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB3C8A
Effect of quantum barrier composition on electro-optical properties of AlGaN-based UVC light emitting diodes
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB2C1A
High detectivity ITO/organolead halide perovskite Schottky photodiodes
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB075D
InSb nanowires for multispectral infrared detection
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB0476
Thermal annealing effects on the electrophysical characteristics of sputtered MoS2 thin films by Hall effect measurements
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB09A5
A hot-carrier assisted InAs/AlGaAs quantum-dot intermediate-band solar cell
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB23D0
Bandgap bowing in crystalline (ZnO)1−x (GaN) x thin films; influence of composition and structural properties
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AAEE4A
XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AAEF9F
Investigation of surface leakage reduction for small pitch shortwave infrared photodetectors
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB1BF8
Influence of rapid thermal annealing on the wafer warpage in 3D NAND flash memory
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AAFCCD
Thermoelectric and electronic properties of chromium substituted tetrahedrite
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AAFA31
Regimes of current transport mechanisms in CdS/CdTe solar cells
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB23B5
Combined STEM-EDS tomography of nanowire structures
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/ab4840
Characterization of a GaAs/GaAsBi pin solar cell
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB23AB
High-performance 1.06-μm InGaAs/GaAs double-quantum-well semiconductor lasers with asymmetric heterostructure layers
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB110B
Effect of C-doped GaN film thickness on the structural and electrical properties of AlGaN/GaN-based high electron mobility transistors
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/ab4b01
Control of complex quantum structures in droplet epitaxy
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB337E
Dual direction SCR with deep well structure for high voltage ESD in communication bus
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB276E
Electron transport mechanism through ultrathin Al2O3 films grown at low temperatures using atomic–layer deposition
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB315D
Multi-pulse Characterization of Trapping/Detrapping Mechanisms in AlGaN/GaN High Electromobility Transistors
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/ab3fe8
Comparison between proton irradiated triple gate SOI TFETS and finfets from a TID point of view
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB118F
Transport-map analysis of ionic liquid-gated ambipolar WSe2 field-effect transistors
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB22EB
Triple-sided charged plasma symmetric lateral bipolar transistor on SiGe-OI
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB10F2
Experimental evidence of the existence of multiple charged states at Al2O3/GaN interfaces
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AAF621
Photosensitive Sb-n-InSb Schottky barrier diodes
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB0A41
a-Si:H TFT-based gate driver circuit using Q node as both pull-up and hold-down controller
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB1FA6
Trap parameters in the infrared InAsSb absorber found by capacitance and noise measurements
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB3C02
Characterization of InGaN quantum dots grown by metalorganic chemical vapor deposition
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/ab4b93
Dielectric based charge carrier tuning for CNT CMOS inverters
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AAF17D
Improvement of NbO x -based threshold switching devices by implementing multilayer stacks
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB1DA3
Fabrication and modeling of SiGe and Ge nanowires on insulator by three-dimensional Ge condensation method
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/ab4a29
Anisotropic lateral oxidation of Al-III–V semiconductors: inverse problem and circular aperture fabrication
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AAF2F1
PECVD grown silicon nitride ultra-thin films for CNTFETs
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB1D31
Effects of gamma irradiation on the electrical characteristics of trench-gate non-punch-through insulated gate bipolar transistor
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB157D
A polarization-induced InN-based tunnel FET without physical doping
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB1F9C
On the predictive, quantitative properties of the amphoteric native defect model
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/ab40e7
Deep levels in metal–oxide–semiconductor capacitors fabricated on n-type In0.53Ga0.47As lattice matched to InP substrates
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB2481
Comparison between nMOS and pMOS Ω-gate nanowire down to 10 nm width as a function of back gate bias
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AAFCCC
Improving extraction efficiency of OLEDs by a luminescent polymer embedded in a colloidal crystal matrix
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB1A9A
Effects of sacrificial oxidation on surface properties of n- and p-type 4H-SiC: implications for metal contact behaviors
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AAEC45
Mixed states of exciton condensation in two dimensional semiconductors
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB063A
Effect of HCl cleaning on InSb–Al2O3 MOS capacitors
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB0331
Realization of GaN-based gain-guided blue laser diodes by helium ion implantation
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/ab429c
Phoniton in a GaAs-AlAs acoustic phonon cavity with a tunable two-level system
来源期刊:Semiconductor Science and TechnologyDOI:10.1088/1361-6641/AB20F5

质量指标占比

研究类文章占比 OA被引用占比 撤稿占比 出版后修正文章占比
97.09%18.64%-0.26%

相关指数

影响因子
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年发文量
自引率
Cite Score

预警情况

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时间 预警情况
2025年03月发布的2025版不在预警名单中
2024年02月发布的2024版不在预警名单中
2023年01月发布的2023版不在预警名单中
2021年12月发布的2021版不在预警名单中
2020年12月发布的2020版不在预警名单中
*来源:中科院《 国际期刊预警名单》

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WOS期刊SCI分区是指SCI官方(Web of Science)为每个学科内的期刊按照IF数值排 序,将期刊按照四等分的方法划分的Q1-Q4等级,Q1代表质量最高,即常说的1区期刊。
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版本 大类学科 小类学科 Top期刊 综述期刊
2025年3月最新升级版
工程技术4区
PHYSICS, CONDENSED MATTER 物理:凝聚态物理
3区
ENGINEERING, ELECTRICAL & ELECTRONIC 工程:电子与电气
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MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合
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2023年12月升级版
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ENGINEERING, ELECTRICAL & ELECTRONIC 工程:电子与电气
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MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合
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PHYSICS, CONDENSED MATTER 物理:凝聚态物理
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2022年12月旧的升级版
工程技术4区
ENGINEERING, ELECTRICAL & ELECTRONIC 工程:电子与电气
4区
MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合
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PHYSICS, CONDENSED MATTER 物理:凝聚态物理
4区