JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
J PHOTOPOLYM SCI TEC
影响因子:0.7
是否综述期刊:
是否预警:不在预警名单内
是否OA:
出版国家/地区:JAPAN
出版社:Tokai University
发刊时间:1988
发刊频率:Semiannual
收录数据库:SCIE/Scopus收录
ISSN:0914-9244

中科院2-4区医学SCI协投:

影响因子0-3分,2-4个月确保录用

医学全方向沾边就收,无需大修

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期刊介绍
Journal of Photopolymer Science and Technology is devoted to the publication of articles on the scientific progress and the technical development of photopolymers.
《光聚合物科学与技术杂志》是一本专门刊登有关光聚合物科学进展和技术发展的文章的杂志。
年发文量 88
国人发稿量 4.4
国人发文占比 0.05%
自引率 -
平均录取率0
平均审稿周期 偏慢,4-8周
版面费 -
偏重研究方向 化学-高分子科学
期刊官网 https://www.jstage.jst.go.jp/browse/photopolymer/
投稿链接 https://www.editorialmanager.com/PHOTOPOLYMER
期刊高被引文献
Bio-mimic Motion of Elastic Material Dispersed with Hard-magnetic Particles
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.309
Non-contact laser printing of ag nanowire-based electrode with photodegradable polymers
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.429
Recent Advances in Cationic Photopolymerization
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.233
Durability Evaluation of Antireflection Structure Replica Mold using High Hardness and Antifouling UV-curable Resin
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.143
The Study of Bile Duct Stent Having Antifouling Properties Using Biomimetics Technique
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.373
Photoluminescence Properties of Novel Fluorescent Polyimide Based on Excited State Intramolecular Proton Transfer at The End Groups
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.449
Trends in Power Module Packaging Technologies and Expectations for Polymer Materials
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.469
Adsorption Phenomena of Anionic and Cationic Nanoliposomes on the Surface of Poly(dimethylsiloxane) Microchannel
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.107
Synchrotron Radiation for the Understanding of Block Copolymer Self-assembly
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.423
Fabrication of Human-Friendly Liquid Crystal Materials with α-Ionone
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.639
Characterization and Control of Hole Missing Defect in EUV Patterning
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.155
Metal Based Materials for EUV Lithography
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.179
Secondary Patternable UV-Imprinted Reworkable Resin by Additional Photoirradiation
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.237
Reaction Kinetics of Active Species from an Atmospheric Pressure Plasma Jet Irradiated on the Flowing Water Surface — Effect of Gas-drag by the Sliding Water Surface —
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.535
Reversible Surface Wettability Control of Fluorinated Polyimides Having Spiropyran Groups by Photo-irradiation
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.481
Influence of hole mobility on charge separation and recombination dynamics at lead halide perovskite and spiro-ometad interface
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.727
Fabrication of Morpho Structures Using Lithographic Techniques
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.367
Structural analysis of ionic photobase generators and lithographic patterning of polysilane films containing the photobase generators
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.265
Refractive Index Modulation by Photo-Fries Rearrangement of Main Chain-Type Aromatic Polyurethanes
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.243
Single-Mode Polymer Embedded Waveguide for Visible Wavelength using SU-8
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.15
Vapochromic Emission Observed for Amorphous Molecular Materials: Emitting Properties of N , N -Bis(9,9-dimethylfluoren-2-yl)-4-nitroaniline
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.185
Improvement of Graphene FET Characteristics by Eliminating Aromatic Rings in Fabrication Resist
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.685
Effects of Plasma Surface Treatment on Cell Adhesion to Biocompatible Polymer Brushes
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.529
Temporary Bonding and Debonding Study with the Newly Developed Room Temperature Mechanical Debonding Material
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.203
Effects of Polymer Gel Electrolyte on Photoelectric Properties and Driving Characteristics of Prussian-Blue-Based Electrochromic Cells in Automatic Driving Circuit
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.33
Solubility Property of Condensable Gases of Trans-1-Chloro-3,3,3-Trifluoropropene and Trans-1,3,3,3-Tetrafluoropropene in UV Nanoimprint
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.123
The Status of Nanoimprint Lithography for High Volume Semiconductor Manufacturing
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.753
ZnO/Polyethyleneimine Ethoxylated/Lithium Bis(trifluoromethanesulfonyl)imide for Solution-Processed Electron Injection Layers in Organic Light-Emitting Devices
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.577
Label-free Nucleic Acid Amplification Detection using Electrochemical Sensors for Liquid Biopsy
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.97
Louver Function in Hybrid Aligned Reverse Mode Using Dual Frequency Liquid Crystal
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.545
Photoresist Challenges for Logic and Memory using 0.33NA EUV Lithography
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.87
Study of Lithograph Characteristics of Black Matrix (BM) Resist
来源期刊:Journal of Photopolymer Science and TechnologyDOI:10.2494/photopolymer.32.677
质量指标占比
研究类文章占比 OA被引用占比 撤稿占比 出版后修正文章占比
100.00%---
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化学4区
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