The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes peer-reviewed papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, microelectromechanical systems, micro-optoelectromechanical systems, and photonics industries.
《微/纳米光刻、MEMS和MOEMS杂志》（JM 3）发表同行评审的论文，内容涉及光刻、制造、封装和集成技术的科学、发展和实践，以满足电子、微机电系统、微光机电系统和光子学行业的需求。
Line roughness estimation and Poisson denoising in scanning electron microscope images using deep learning
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.024001
Mechanistic insights in Zr- and Hf-based molecular hybrid EUV photoresists
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.013504
Localized and cascading secondary electron generation as causes of stochastic defects in extreme ultraviolet projection lithography
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.013503
Lithography hotspot detection using a double inception module architecture
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.013507
Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.014002
Reconstructing the three-dimensional latent image of extreme ultraviolet resists with resonant soft x-ray scattering
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.024003
Review of scanning electron microscope-based overlay measurement beyond 3-nm node device
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.021206
Kinetic approach to defect reduction in directed self-assembly
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.4.043502
Review of microshutters for switchable glass
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.4.040901
Estimating extremely low probability of stochastic defect in extreme ultraviolet lithography from critical dimension distribution measurement
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.024002
Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.013506
Contact inspection and resistance–capacitance measurement of Si nanowire with SEM voltage contrast
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.021205
Probability prediction model for bridging defects induced by combined influences from lithography and etch variations
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.023503
Studying resist performance for contact holes printing using EUV interference lithography
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.013501
Super-resolved critical dimensions in far-field I-line photolithography
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.013505
Standard wafer with programed defects to evaluate the pattern inspection tools for 300-mm wafer fabrication for 7-nm node and beyond
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.023505
Deep silicon etching for thermopile structures using a modified Bosch process
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.024501
Development of standard samples with programmed defects for evaluation of pattern inspection tools for 7-nm and smaller nodes
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.3.033503
Special Section Guest Editorial: Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.011001
Design, simulation, and fabrication of three-dimensional microsystem components using grayscale photolithography
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.4.043507
Model improvements to simulate charging in scanning electron microscope
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.4.044003
Influence of secondary effects in the fabrication of submicron resist structures using deep x-ray lithography
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.023502
Electrostatically tunable MOEMS waveguide Bragg grating-based DWDM optical filter
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.015503
Low-power three-degree-of-freedom Lorentz force microelectromechanical system mirror for optical applications
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.015001
Method to fabricate taper waveguide using fixed-beam moving stage electron-beam lithography
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.4.043503
Influence of e-beam aperture angle on critical dimensions-scanning electron microscopes measurements for high aspect ratio structure
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.021204
Tilted beam scanning electron microscopy, 3-D metrology for microelectronics industry
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.3.034001
Broadband antireflective light-blocking layer using nanoparticle suspension in photoresist with high-resolution patterning
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.015501
Analyzing wafer leveling data from high-volume manufacturing to identify the sources of inline defectivity
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.014001
Characterizing interlayer edge placement with SEM contours
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.021203
SoulNet: ultrafast optical source optimization utilizing generative neural networks for advanced lithography
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.jmm.18.4.043506
Mathematical analysis of intensity distribution of the optical image in various degrees of coherence of illumination (representation of intensity by Hermitian matrices)
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.021101
Surface effects in simulations of scanning electron microscopy images
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.4.044002
Reduction in a-Si:H density utilizing a secondary plasma
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.4.044502
Tunable microlaser based on precisely formed dye-doped microsphere cavity
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.4.045501
Overlay error investigation for metal containing resist
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.4.044001
Understanding photoacid generator distribution at the nanoscale using massive cluster secondary ion mass spectrometry
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.3.033502
Spiral spring electrostatic actuator for double-layer deformable mirror with continuous phase sheet
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.025501
Random forest-based robust classification for lithographic hotspot detection
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.023501
Low-cost optical splitter for neural stimulations using off-the-shelf ultraviolet adhesives
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.015502
Overlay error statistics for multiple-exposure patterning
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.021202
Extreme UV secondary electron yield measurements of Ru, Sn, and Hf oxide thin films
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.3.033501
H2S MEMS-based gas sensor
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.025001
Improved HNA isotropic etching for large-scale highly symmetric toroidal silicon molds with <10-nm roughness
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.4.044501
Orientation control of high-χ triblock copolymer for sub-10 nm patterning using fluorine-containing polymeric additives
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.3.035501
Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy (Erratum)
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.jmm.18.1.019801
Extended-gate field-effect transistor-based pesticide microsensor for the detection of organophosphorus and carbamate
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.1.015002
Nanoscale molecular analysis of photoresist films with massive cluster secondary-ion mass spectrometry
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.2.023504
Through-pellicle imaging of extreme ultraviolet mask with extreme ultraviolet ptychography microscope
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.3.034005
CD metrology for EUV resist using high-voltage CD-SEM: shrinkage, image sharpness, repeatability, and line edge roughness
来源期刊：Journal of Micro/Nanolithography, MEMS, and MOEMSDOI：10.1117/1.JMM.18.3.034004
